美國薩凡納藝術與設計學院服裝留學要求
2023-08-29 09:50:38 來源:中國教育在線
美國薩凡納藝術與設計學院服裝留學要求,相信這個問題是許多正在準備留學的同學關心的一個問題,那么下面小編就來和大家說一說,感興趣的您趕緊往下了解吧。
一、院校介紹
SCAD是全美最大的藝術學院,也是全球最大的專門藝術大學之一。位于佐治亞州有著200多年的歷史古城薩凡納市。由于整個城市的古建筑保存完好,這里被人們稱為美國最美麗的城市之一。學院建筑系的教學樓是一座建于1887年的古屋,而整個城市更像是一座活生生的建筑博物館,有著百年歷史的建筑隨處可見,現在仍舊有人居住和使用。
院校排名:薩凡納藝術與設計學院在2019QS世界大學專業排名(藝術&設計)中,名列世界第47,美國第16。
School of Design設計學院:
設計學院下面設有以下幾個系:可持續設計(Design for sustainability)MA,設計管理(Design management)MA、MFA,纖維(Fibers),工業設計(Industrial design)BFA / MA、MFA,珠寶設計系(Jewelry and objects)BFA / MA、MFA,服務設計(Service design)BFA / MFA。這些專業都是在薩凡納校區上課。
二、服裝設計申請要求
申請專業
M.F.A. in fashion 90學時
作品集要求
Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.
托福/雅思要求:
SCAD's TOEFL institution code is 5631.
申請專業
M.A. in fashion 45學時
作品集要求
Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.
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